用紫外光表面處理方法清除砷化鎵表面的碳?xì)浠衔?/h2>
UV SURFACE CLEANING METHOD FOR REMOVING HYDROCARBONS FROM GaAs SURFACE
-
摘要: 正 1.引言 獲得一個(gè)潔凈的表面對(duì)Ⅲ-Ⅴ族化合物光電陰極、薄膜科學(xué)、熱壓粘結(jié)、半導(dǎo)體外延技術(shù)以及其它現(xiàn)代表面工藝是至關(guān)重要的。物體表面吸附的污染物是各種各樣的。最常見的是氧化物、碳?xì)浠衔锖透鞣N氣體。為了清除這些吸附物,人們?cè)扇《喾N措施,如用各種化學(xué)溶劑清洗、真空加熱清潔、電子轟擊、等離子體轟擊以及氬離子濺射等等。這些清潔方法都各起其特有的作用。如化學(xué)溶劑和真空加熱清潔方法,能
-
關(guān)鍵詞:
Abstract: A simple but high-efficient UV surf ace cleaning method for removing absorbed hydrocarbons from GaAs surface is described. The analytic results of Auger spectra show that the method is very effective. -
I. Shiota, et al., J. Eletrochem. Soc.: Solid-State Science and Technology,124(1977), 155.[2]Y. Z. Lui, J. L. Moli and W.E. Spicer, Appl. Phys. Lett., 14 (1969), 275.[3]S. Garbe and G. Frank, Solid-State Commun., 7(1969), 615.[4]H. W. Prengle, et al., Hydrocarbon Processing, pp. 82-86, Oct. 1975.[5]J. G. Clavert and J. N. Pitts, Jr.,Photochemistry, pp. 205-209, 681-705.John Wiley and Sons, New York. 1965.[6]J.R.McNesby and H. Okabe, Advances in Photoobhemistry, Vol. 3, 1964, pp. 166-174.[7]J.R.Vig, UV/Ozon Cleaning of Surfaces: A Review, Private communication. -
計(jì)量
- 文章訪問數(shù): 1840
- HTML全文瀏覽量: 112
- PDF下載量: 389
- 被引次數(shù): 0
下載:
