非晶硅肖特基太陽電池的I-V特性分析
THE I-V CHARACTERISTIC ANALYSIS OF SCHOTTKY AMORPHOUS SILICON SOLAR CELLS
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摘要: 本文提出了一種在光照和短路條件下測量Ni/-Si∶H肖特基結(jié)勢壘寬度的方法。同時,又在實驗確定的參數(shù)的基礎(chǔ)上,從理論上計算了在AM1太陽光譜照射下Ni/-Si∶H太陽電池的I-V曲線。由此得到的非晶硅少子擴散長度的數(shù)值與作者1983年用表面光電壓法(SPV)測得的是一致的。從計算結(jié)果出發(fā),著重分析了影響填充因子的各種因素。與實驗對比可以得出結(jié)論:被測太陽電池的填充因子小是串、并聯(lián)電阻造成的,而不是擴散長度太短的緣故。
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關(guān)鍵詞:
Abstract: The present paper introduces an experimental method for measuring the width of illuminated and short-circuited Ni/a-Si: H Schottky barriers. The current-voltage curves for the Schottky barrier solar cells under AM1, 100 mW/cm2 illumination are caleulated by using the parameters determined by experiments. The diffusion length of holes in a-Si:H obtained from the illuminated I-V curve is consistent with the results measured by the author with the surface photovoltage method in 1983. The factors affeeting the fill factor are analysed on the basis of the calculated results. A comparison of the calculated results to the experiment's reveals that the very low fill factor of the solar cells measured is due to series and shunt resistances rather than the low diffusion length of the holes. -
M. H. Brodsky, Amorphous Semiconductors, Springer-Verlag,Berlin, 1979, Chap. 10.[2]Y.Kuwano, S. Tsuda and M. Ohnishi, Jpn. J. Appl. Phys. 21(1982), 235.[3]M.Konagai, H. Miyamoto and K.Takahashi, ibid, 19(1980),1923.[4]徐樂,劉啟一,電子科學(xué)學(xué)刊,6(1984), 247.[5]A. Catalano et al., 16th IEEE Photovoltaic Specialists Conf., San Diego, (1982).[6]A. R. Moore, J. Appl. Phys.,54(1983), 222.[7] Xu Le, D. K. Reinhard and M.G.Thompson, IEEE Trans. on ED, ED-29(1982), 1004.[7]R. C. Neville, Solar Energy Conversion: The Solar Cell,Elsevier Scientific Publishing Co. New York, 1978, p.37.[8]F.S.Sinencio and R. Williams, J. Appl. Phys., 54(1983), 2757.[9]R.S. Crandall, R. Williams and B. E. Tompkins, ibid, 50(1979),5506.[10]J.Beichler, W. Fuhs, H. Mell and H. M. Welsch, J. Non-Cryst.[11]Solids, 35/36 (1980), 587. -
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