高精度30kV高壓穩(wěn)壓電源的研制
DEVELOPMENT OF HIGH-PRECISION REGULATED POWER SUPPLY WITH 30kV HIGH VOLTAGE
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摘要: 本文介紹了為新型電子束曝光機研制的高精度30kV高壓穩(wěn)壓電源。該電源采用雙閉環(huán)調(diào)整,集中補償和分散補償相結(jié)合的設(shè)計方案。對電源的關(guān)鍵性技術(shù)采取了有力措施,使各項技術(shù)指標(biāo)均達(dá)到設(shè)計要求。
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關(guān)鍵詞:
- 高壓穩(wěn)壓電源; 高精度; 高穩(wěn)定性
Abstract: A high-precision regulated power supply for a new type electron beam lithography system with 30 kV high voltage is recommended. The design scheme of double closed loop regulation and the design scheme of centralized compensation combined with dispersed compensation are adopted. In accordance with the technical requirements of regulated power supply, some key technigues have been properly handled. All it s qualifications satisfy or exceed the original design requirements. -
劉恩璽, 第三屆電原技術(shù)年會論文集, 198年,第198頁.[2]莫忠學(xué),第三屆電源技術(shù)年會論文集,1980年,第113頁.[3]倪本來編著,高穩(wěn)定度電源,人民郵電出版社,1982年12月.[4]顧曉紅,陳志堅,模擬電路交流資料之三,1982年5月,第34頁. -
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