W[111]尖端場發(fā)射電子槍的工作特性
OPERATING CHARACTERISTICS FOR A FIELD EMISSION GUN WITH W[111] TIP
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摘要: 本文報(bào)道了單晶W[111]尖端的制作,以及由W[111]尖端陰極,第一、二陽極組成的三極場發(fā)射電子槍(FEG)的工作特性。實(shí)驗(yàn)結(jié)果表明,這種FEG在槍室真空為510-7Pa,加速電壓在30kV的條件下,其虛源半徑為1.6nm;亮度為3.8109A/cm2.sterad;場發(fā)射電流為1A時(shí),束流穩(wěn)定性為5%(10min內(nèi))。說明它是一種較理想的點(diǎn)狀電子源,在實(shí)際應(yīng)用中具有廣泛發(fā)展前景。
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關(guān)鍵詞:
- 場發(fā)射電子槍; W[111]尖端; 虛源半徑; 亮度; 束流穩(wěn)定性
Abstract: The fabrication method of W[111] tip and the operating characteristics ofa field emission gun (PEG) which consists of W[111] tip, first and second anodes are reported. Experimental results show that on condition that the vacuum in the gun chamber is better than 510-7 Pa and acceleration voltage is 30kV, the finite radius of the virtual source of the FEG is 1.6nm, and the brightness of FEG is estimated as 3.8109 A/cm2, sterad; on condition that the field emission current is 1A, the stability of beam current is better than 5% in 10 min. It is able to be used in scanning electron microscopesand electron probe system etc. -
A. V. Crewe et al., J. Appl. Phys., 39(1968) 13, 5861-5868.[2]A. V. Crewe et al., Science, 168(1970) 39, 1338-1340.[3]A. Tonomura et al., J. Electron Microscopy, 22(1973) 1, 141-146.[4]G. Bining et al., Appl. Phys. Lett., 40(1982) 2, 178-180.[5]G. Bining et al., Phys. Rev. Lett., 49(1982) 1, 57-61.[6]楊德清等,微細(xì)加工技術(shù),1988年,第1期,第30-34頁.[7]楊德清等,云南大學(xué)學(xué)報(bào)(自然科學(xué)版),10(1988)2,167-171.[8]劉學(xué)愨,陰極電子學(xué),科學(xué)出版社,北京,1980年,第258頁.[9]楊德清等,電子科學(xué)學(xué)刊,12(1990)6,660-6650.[10]楊德清等,微細(xì)加工技術(shù),1991年,第1期,第14-19頁.[11]陸家和等,表面分析技術(shù),電子工業(yè)出版社,北京,1987年,第98頁.[12]唐天同,應(yīng)用帶電粒子光學(xué)引論,西安交通大學(xué)出版社,西安,1986年,第322-324頁.[13]唐天同,應(yīng)用帶電粒子光學(xué)引論,西安交通大學(xué)出版社,西安,1986年,第317頁.[14]C. Wiener et al., J. Appl. Phys.,44(1973)5,2140--2148. -
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