一種新的非均勻減薄法選擇陽極氧化法
A NEW TECHNIQUE FOR THINNING THE THICKNESS OF UNUNIFORM EPILAYERS--SELECTIVE ANODIC OXIDATION
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摘要: 提出了一種新的非均勻減薄法,即選擇陽極氧化法。用于n+-n-n++GaAs高低結(jié)雪崩二極管的n+層厚度的控制,使器件的效率達(dá)到理論值。
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關(guān)鍵詞:
- 半導(dǎo)體工藝; 減薄技術(shù); 選擇陽極氧化
Abstract: A new technique called selective anodic oxidation, by which the ununiform epilayers can be thinned, is presented. The thickness of n+-layers of GaAs IMPATT diodes with n+-n-n++ structure has been strictly controlled by the use of this technique. This results in the efficiency of IMPATT diodes up to its theoretical value. -
Ho-Chung Huang, IEEE Trans. on ED, ED-20(1973), 482. -
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