變形電子束曝光機(jī)成形偏轉(zhuǎn)器的設(shè)計(jì)和性能
DESIGN AND PERFORMANCE OF SHAPING DEFLECTORS FOR VARIABLE SHAPED ELECTRON BEAM LITHOGRAPHY
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摘要: 在變形電子束曝光機(jī)中,為使曝光均勻必須保證靶上束斑電流密度物邊緣分辨率不隨束斑形狀和尺寸的變化而改變。實(shí)現(xiàn)這一目標(biāo)的關(guān)鍵是正確設(shè)計(jì)成形偏轉(zhuǎn)器。本文討論采用高靈敏度平行板偏轉(zhuǎn)器實(shí)現(xiàn)成形偏轉(zhuǎn)時(shí),為達(dá)到上述目標(biāo)應(yīng)進(jìn)行的線性補(bǔ)償和旋轉(zhuǎn)補(bǔ)償?shù)脑O(shè)計(jì)計(jì)算方法。給出了用實(shí)驗(yàn)方法改變電子源象與偏轉(zhuǎn)板幾何中心的軸向距離所測(cè)得的線性補(bǔ)償因子和旋轉(zhuǎn)補(bǔ)償因子的值。實(shí)驗(yàn)結(jié)果與計(jì)算值符合較好。
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關(guān)鍵詞:
- 電子束曝光機(jī); 電子光學(xué); 偏轉(zhuǎn)器
Abstract: In order to obtain uniform exrnosure in variable shaped electron beam lithography, the beam current density and edge resolution on the target must not change for different spot shapes and sizes. The key to the goal is the anpropriate design of shaping deflectors. A linear and rotation compensation approach is presented. Values of linear and rotation compensation factors versus the distances between electron source image and centers of deflectors are measured on an experimental electron beam column with variable spot shaping. The experimental results are in good agreement with the calculated ones. -
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