超薄的金屬/LB絕緣膜/半導(dǎo)體結(jié)構(gòu)的CV和I-V特性
C-V AND I-V CHARACTERISTICS OF ULTRATHIN METAL/LB INSULATING FILMS/SEMICONDUCTOR STRUCTURE
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摘要: 本文研究了超薄的金屬/LB絕緣膜/半導(dǎo)體(MLS)結(jié)構(gòu)的C-V和I-V特性,理論分析與實(shí)驗(yàn)結(jié)果相一致,結(jié)論如下:(1)超薄MLS結(jié)構(gòu)具有正常的C-V特性和I-V特性;(2)以LB薄膜作為絕緣層可調(diào)整肖特基器件勢(shì)壘高度。
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關(guān)鍵詞:
- LB絕緣薄膜; C-V特性; I-V特性
Abstract: C-V and I-V characteristics of ultratllin metal/LB insulating films/semiconductor structure are studied. Theoretical analysis are well in accord with experimental results. The results indicate that: (1) Ultrathin MLS structure has normal C-V and I-V characteristics; (2) It is possible to modify the barrier height of Schottky devices by using LB thin films as insulators. -
專集,日本科學(xué)與技術(shù),2(1987), 1-72.[2]任云珠等,固體電子學(xué)研究與進(jìn)展,6(1986)4, 337- 341.[3]舒占永等,采用Langmluir-Blodgett技術(shù)制備MOCVD-InP MIS結(jié)構(gòu),1988年全國(guó)LB膜學(xué)術(shù)討論會(huì)文集,河南,開(kāi)封. -
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