掃描電子束曝光機復合物鏡的研究與設計
RESEARCH AND DESIGN ON THE COMBINED OBJECTIVE LENSES FOR ELECTRON BEAM LITHOGRAPHY SYSTEMS
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摘要: 在綜合研究已有的各種復合物鏡(如移動物鏡、變軸物鏡和擺動物鏡等)的基礎上,本文對復合物鏡的一般理論進行了探討,推導了普遍化計算公式,并提出新的復合物鏡(彎曲物鏡)系統(tǒng)。采用解析函數(shù)近似表示系統(tǒng)場分布,對彎曲物鏡系統(tǒng)象差進行了理論分析,并設計出一個實際系統(tǒng)。數(shù)值計算結(jié)果給出該系統(tǒng)在55mm2掃描場內(nèi),束孔徑角5mrad和能散2.5eV下,最大彗差0.005m,橫向色差0.001m。Abstract: Based on the synthetic study of the previous magnetic combined objective lenses, such as MOL (moving objective lens), VAL (variable axis lens), SOL (swinging objective lens) etc; the general theory of combined objective lenses is approached, and a set of general formulas is presented. A new combined objective lens called Bent Objective Len (BOL) is proposed for improving the optical properties in electron beam systems. Using the analytical functions of the magnetic lens field and electron ray, the aberration analysis of the BOL system is performed, and a practical BOL system is also designed. The numerically computational results indicate that this system offers extremely small coma and transverse chromatic aberrations. At the corner of a 5 X 5mm2 deflection field with a 5 mrad aperture angle and 0.0001 beam voltage ripple, the beam blur caused by coma is 0.00.5 m nad the transverse chromatic aberration is 0.001 m.
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H. Ohiwa, et al., Electronics and Communications in Japan, 54-8(1971)12, 44.[2]H. C. Pfeiffer, G.O.Langner, J. Vac. Sci. Technol., 19(1981)4, 1058.[3]Chen Zhongwei, et al., Optik, 64(1983)4, 341.[4]M, A. Sturans, H. C. Pfeiffer, Proc. Microcircuit Engineering,1984, Academic Press,London, P. 107.[5][5][6]Qiao Yizheng, et al., The Principle of Pendulum Combined Focusing and Deflection System, International Symposium on Electron Optics, Beijing, China, (1986), p. 207.[7]H. C. Chu, E. Munro, Optik, 81(1982)2, 121. -
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