DJ-2型可變矩形電子束曝光機(jī)電子光學(xué)設(shè)計
ELECTRON OPTICAL COLUMN FOR VARIABLE RECTANGULAR-SHAPED BEAM LITHOGRAPHY SYSTEM DJ-2
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摘要: 本文討論可變矩形電子束曝光機(jī)的電子光學(xué)設(shè)計,著重分析光路構(gòu)成和變形偏轉(zhuǎn)補(bǔ)償?shù)葐栴}。DJ-2型機(jī)使用最少的透鏡數(shù)實現(xiàn)變形束曝光機(jī)的功能要求。為實現(xiàn)高速變形偏轉(zhuǎn),采用高靈敏度串接式平板靜電偏轉(zhuǎn)器,通過精確的線性補(bǔ)償和旋轉(zhuǎn)補(bǔ)償,使靶上束斑電流密度和分辨率以及原點位置不受束斑尺寸改變的影響。實驗結(jié)果表明,用發(fā)夾型鎢絲陰極時的束流密度大于0.4A/cm2;22mm掃描場內(nèi)邊緣分辨率優(yōu)于0.2m。
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關(guān)鍵詞:
- 電子光學(xué); 電子束曝光機(jī); 可變矩形束
Abstract: The electron optical column for variable rectangular-shaped beam lithography system DJ-2 is described, with emphasis on the analysis of optical configuration and shaping deflection compensation. In this column the variable spot shaping is performed with a minimum number of lenses by a more reasonable optical scheme. A high-sensitivity electrostatic shaping deflector with serial parallel-plates is employed for high-speed spot shaping. With the accurate linear and rotational approaches, the spot current density of over 0.4 A/cm2 is obtained, with a tungsten hairpin cathode, and the edge resolution is better than 0.2 m within 2 X 2 mm field size. -
H. C. Pfeiffer, J. Vac. Sei. Technol., 15(1978)3, 887-890.[2]J. Trotel, J. Vac. Sci. Technol., 15(1978)3, 872-873.[3]E. Goto et al., J. Vac. Sci. Technol,, 15(1978)3, 883-886.[4]G. Cogswell et al., Electron lithography system with variable-shaped electron beam, Proc. 8th International[5]Conference on Electron and Ion Beam Science and Technology, Seattle, USA, (1978), pp. 117-133.[6]N. Saitou et al., J. Vac. Sci. Technol., 18(1981)4, 1087-1093.[7]M. Nakasuji et al., J. Vac. Sci. Technal., 19(1982)3, 872-878.[8]H. C. Chu(朱協(xié)卿) et al., Optik, 81(1982)2, 121-145.[9]A. V. Crewe, Optik, 92(1978)4, 337-346.[10]康念坎等,電子科學(xué)學(xué)刊,12(1990)2,161-168.[11]N. Saitou et al., J. Vac. Sci. Technol., B3(1985)1, 98-101.[12]R. D. Mooore et al., J. Vac. Set. Technol., 18(1981)4, 950-952. -
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