長脈沖大面積強(qiáng)流電子束源
A LONG PULSE LARGE AREA INTENSE ELECTRONBEAM SOURCE
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摘要: 本文介紹的長脈沖大面積強(qiáng)流電子束系統(tǒng)是為橫向泵浦和控制放電泵浦大能量氣體激光而設(shè)計(jì)和研制的。電子束能量為200250keV,脈寬約為13s,電流密度在0.58A/cm2范圍內(nèi)可調(diào),束截面積約為10010cm2。用這臺電子束系統(tǒng)已成功地進(jìn)行控制放電泵浦XeCl激光,在1.91的激活體積中獲得激光能量為1J。今年又用它作為CO2激光的泵浦源,在7.851的體積內(nèi)初步獲得360J的激光能量。
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關(guān)鍵詞:
Abstract: The long pulse electron beam system reported here was constructed for transverse pumping and e-beam sustained discharge large energy gas laser. The electron beam parameters are: the beam energy about 200-250 keV, pulse duration (PWHM) about 1-3s, current density in 0.5-8 A/cm2 range and beam area 10010cm2. With this system, we have performed XeCl laser experiments and obtained laser energy output-1J in 1.9 1 active volume. Recently this system was used as a pumping source for CO2 laser, and we have preliminarily obtained 360 J laser energy in 7,85 1 active volume. -
Charles Coson, et al., Appl. Phys. Lett,23(1973), 110; J. C. Hsia, et al., AD-A047684.[2]洪浦,電子學(xué)通訊,2(1980), 37.[3]R. K. Parker, et al., J. Appl. Phys., 45(1974),2463.[4]的場幹史.レーザー研究,6(1978), 168. -
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